New Methodology Enhances Control Over Disorder in Nanopattern Arrays
A team from Seoul National University has introduced a novel method for designing and managing disorder in nanopattern arrays, utilizing metal-infiltrated block copolymer thin films.
Editorial Staff
1 min read
Updated about 20 hours ago
Researchers at Seoul National University have made significant strides in the field of nanotechnology by developing a new methodology aimed at controlling disorder in nanopattern arrays.
Led by Professor So Youn Kim, the team focuses on the degree of disorder, which is crucial for the performance of wave-guiding devices.
The innovative approach employs metal-infiltrated block copolymer thin films, potentially paving the way for advancements in various applications within nanotechnology.